How shall I version my design so we can rollback?

[Jirong Hu]

We have a set of standard schemes (Issue Type (EG_ITSS), Workflow(EG_WFS), Screen(EG_SS), Fields(EG_FS)) for IT projects in our organization. When we are making changes, how shall we version different things properly. This is what I am thinking:

1. If I change the Defect workflow, then I shall create a new Defect_v2 workflow, then a new EG_WFS_v2 to use the new Defect_v2 workflow.
2. If I change the Defect_Screen, then I shall create a new Defect_Screen_v2, then a new EG_SS_v2 to use the new Defect_Screen_v2.
3. If I change the custom fields, then I shall create a new EG_FS_v2.

This way, our standard set of schemes are always advancing too, if I just do 1., then the set of standard schemes will be (EG_ITSS, EG_WFS_v2, EG_SS, EG_FS). 

Does this sounds right? How you guys are doing it? Is there a way to baseline the whole design in JIRA so we can easily rollback? How do you guys normally do the change to the production environment? Just update the current version?

A related question is here: https://answers.atlassian.com/questions/12267539 One problem is we have a hundred projects and JIRA doesn't provide a solution for bulk change: https://answers.atlassian.com/questions/104158. It's almost impossible to change all of them manually if I create a new version of scheme? 

Thanks

Jirong

[Jirong Hu]

I've decided on the following approach, what do you guys think?

1. Make a copy of everything I need to change, e.g. copy Defect workflow to Defect_18022015 as the backup. This backup will be used during rollback.
2. Directly make changes to the existing objects such as the Defect workflow and publish it.

This approach is fast in making changes to the production environment, but slow in rollback (we have to modify each project to rollback).

Jirong

[Jirong Hu]

I was wrong about the rollback. Actually it's very easy, all I need to do is rename the schemas, no need to change every project settings. I am working with this approach and it works well so far.